AFM and Raman Studies of Chemical Bath Deposited Nickel Sulphide Films
AFM and Raman Studies of Chemical Bath Deposited Nickel Sulphide Films |
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© 2025 by IJETT Journal | ||
Volume-73 Issue-2 |
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Year of Publication : 2025 | ||
Author : Ho Soonmin, K. Mohanraj |
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DOI : 10.14445/22315381/IJETT-V73I2P104 |
How to Cite?
Ho Soonmin, K. Mohanraj, "AFM and Raman Studies of Chemical Bath Deposited Nickel Sulphide Films," International Journal of Engineering Trends and Technology, vol. 73, no. 2, pp. 39-45, 2025. Crossref, https://doi.org/10.14445/22315381/IJETT-V73I2P104
Abstract
Nickel sulphide thin films were deposited onto microscope glass substrate through chemical bath deposition method in acidic conditions. In this work, nickel sulphate and sodium thiosulfate were employed as reaction starting materials to produce binary compounds. Different solution concentrations (0.075 M, 0.1 M, and 0.15 M) and deposition times (12 hours and 33 hours) were used to investigate the properties of films for the first time. According to the Atomic Force Microscopy analysis, the best morphology could be observed when the films were prepared using 0.1M of solution, 12 hours and 33 hours, respectively. These films indicated uniform morphology and homogeneous surface if compared to other samples. Based on Raman spectroscopy results, the highest intensity could be recorded for these samples also.
Keywords
Photovoltaic, Renewable energy, Energy efficiency, Thin films, Solar cell applications, Semiconductor materials, Energy consumption.
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