Thin Film Analysis by Infrared Spectroscopy
Thin Film Analysis by Infrared Spectroscopy |
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| © 2025 by IJETT Journal | ||
| Volume-73 Issue-3 |
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| Year of Publication : 2025 | ||
| Author : Ho Soonmin, Olasanmi Oluwatoyin O |
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| DOI : 10.14445/22315381/IJETT-V73I3P113 | ||
How to Cite?
Ho Soonmin, Olasanmi Oluwatoyin O, "Thin Film Analysis by Infrared Spectroscopy," International Journal of Engineering Trends and Technology, vol. 73, no. 3, pp. 174-182, 2025. Crossref, https://doi.org/10.14445/22315381/IJETT-V73I3P113
Abstract
Metal chalcogenide thin films have been synthesized through various deposition techniques. These films have found numerous applications, including in solar cells, opto-electronic devices, laser systems, sensors, electroluminescent devices, and light-emitting diodes. A range of analytical tools has been employed for the characterization of these thin films, including X-ray diffraction, atomic force microscopy, scanning electron microscopy, energy dispersive X-ray analysis, UV-visible spectrophotometry, Raman spectroscopy, photoluminescence spectroscopy, and X-ray photoelectron spectroscopy. In this study, different types of thin films were produced using both physical and chemical deposition methods. The analytical method known as Fourier Transform Infrared Spectroscopy is used to identify organic, polymeric, and occasionally inorganic materials. Infrared light is used in the FTIR analysis method to scan test samples and observe chemical properties from 4000 cm-1 to 400 cm-1. FTIR spectra indicated that the characteristic peaks were influenced by variations in experimental parameters such as temperature, heating processes, pH levels, and the presence of complexing agents, solution concentration, deposition duration, and the number of deposition cycles.
Keywords
Thin films, Solar cells, Energy efficiency, Energy consumption, Fourier transform infrared spectroscopy.
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