Structural and Optical Properties of Chromium Doped Aluminum Nitride Thin Films Prepared by Stacking of Cr Layer on AlN Thin Film
Citation
Norazlina M. S. , Shanmugan S. , Mutharasu D. "Structural and Optical Properties of Chromium Doped Aluminum Nitride Thin Films Prepared by Stacking of Cr Layer on AlN Thin Film", International Journal of Engineering Trends and Technology (IJETT), V9(13),667-670 March 2014. ISSN:2231-5381. www.ijettjournal.org. published by seventh sense research group
Abstract
Chromium stacked aluminum nitride (Cr-AlN) thin film was deposited on glass substrates by elemental stack method using rf sputtering. Annealing treatment was carried for about 1 hour at 100?C, 300?C, and 500?C in nitrogen atmosphere for doping. Variations of the structural and optical properties of the films were studied using XRD, AFM, FESEM and UV-Vis spectroscopic technique. Structural analysis showed the presence of only (111) planes with very low intensity. From AFM and FESEM images, reduced grain size and smoothened surface morphology was achieved as the annealing temperature increases. Improved optical transmittance of Cr-AlN may be due to the diffusion of Cr into AlN as the annealing temperature increases. Decreased film thickness was also noticed for Cr-AlN thin film with annealing temperatures.
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Keywords
AlN, Structural analysis, Optical Properties.