Optimization of Dielectric Parameters for the Design of Optical Bandpass Filters
How to Cite?
Jegan Antony Marcilin, N.M. Nandhitha, G. Yogalakshmi, "Optimization of Dielectric Parameters for the Design of Optical Bandpass Filters," International Journal of Engineering Trends and Technology, vol. 70, no. 3, pp. 13-21, 2022. Crossref, https://doi.org/10.14445/22315381/IJETT-V70I1P202
With the advent of technology, it is possible to design thin film optical bandpass filters for the desired wavelength and Full-Width Half Maximum (FWHM). A stack of high and low refractive index thin films of suitable thickness can result in the desired wavelength (as the amplitude of other wavelengths are attenuated and amplitude of the desired wavelength is amplified). The choice of the dielectric material, the thickness of the dielectric materials, and the stacking options of these dielectric materials affect the interference pattern. The proposed research work aims at developing optimization techniques for the selection of thin films and the number of layers to be deposited. In this paper, the design of the H alpha filter (656.3 nm), H beta (486.1 nm), and Carbon III (464.7nm) is discussed. The dielectric materials are Magnesium Fluoride and Zinc Sulphide. The impact of stacking and thickness on the attenuation of wavelengths is also studied.
Central Wavelength (CWL), H alpha, H Beta, Full Wave Half Maximum (FWHM).
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